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The largest developments in modern technology are built using the smallest integrated circuits. These advanced semiconductor chips are manufactured using state of the art processes that need to be monitored and controlled. Introducing our new PWG5™ patterned wafer geometry and nanotopography system! Inline process monitoring and data feed forward using the PWG5 provides overlay and lithography focus window control, while process feedback accelerates R&D and improves yield for high volume manufac
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KLA is proud to sponsor and exhibit at #SEMICONEuropa in Munich, November 18–21. Visit us at Booth B1141 to explore our latest process control and wafer processing solutions, and join Richard Barnett’s talk on November 18 at 4:10 pm: “Plasma Etch and Deposition for III-Vs: Driving Performance in Photonics, RF and Power Applications” during the III-V Summit. Come join us and discover what we're all about! https://bit.ly/4qWPASA #KLAatSEMICON | KLA Corporation
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