SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development - Agreement builds on more than a decade of collaboration between the two …

Oct 20, 2025 · SCREEN will exhibit at SEMICON Europa 2025, held from November 18 (Tuesday) to 21 (Friday) in Munich, Germany. Our representatives look forward to welcoming …

各 位 会社名 代表者名 問合せ先 2025 年5 月9日 株式会社SCREENホールディングス 取締役社長廣江 敏朗 (コード番号7735 東証プライム市場) 秘書室長吉村 清秀

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1. These systems enable half-pitch transfer of wafers. The size of baths has been reduced to minimize the volume of chemicals and DI water used. 2. The CHB chemical circulation bath …

Kyoto, Japan – October 2, 2024 – SCREEN Graphic Solutions Co., Ltd. (SCREEN GA) opens its new Inkjet Innovation Center Kyoto this October. The center is located at SCREEN GA’s …

The SS-80EX features the same advanced spin scrubber technology developed by SCREEN over many years while also delivering significantly improved functionality. High-speed processing of …

1. High Throughput The FC-3100 is capable of achieving a high throughput of 1,000 wafers per hour, which has been realized by incorporating a high throughput buffer module and a high …

Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

Recipes are easy to create, and entering optical constants is simple, thanks to SCREEN's experience in the field. The software can be controlled almost entirely using the mouse, and …