10nm pattern generation using thermal scanning probe lithography enabled by simplified materials and processes Thermal scanning probe lithography (tSPL) has been used to create patterns with sub-20 nm ...

Download this article in PDF format. Finding the right balance among test cost, test quality, and data collection for running diagnosis requires consideration of several competing factors. Luckily ...

When semiconductor devices had geometries of 0.18 microns and larger, most defects manifested themselves as static faults. Test strategies based on stuck-at fault-model scan patterns and standard ...

Scan diagnostics play an important role in improving yield. As technologies move below 130 nm, the IC industry has seen a significant change in the type of defects encountered. Feature-related defects ...

Whorls of FLASH: (a) Optimized scan patterns; (b) comparison of standard (non-optimized) line-by-line and scan-pattern optimized (SPO) patterns. The resulting pencil-beam scanning dose rate (PBS-DR) ...